10/12/2020 / Last updated : 13/01/2021 gaspedia semiconductor

TNSC MOCVD equipment division receiving the Industry Award

GaN and AlN devices has received the 2020 Industry Award from The Japan Society of Vacuum and Surface Science Taiyo Nippon Sanso Corporation (“TNSC”) (President:Kenji Nagata) announces that its MOCVD equipment division for advanced GaN and AlN devices has received the 2020 Industry Award from The Japan Society of Vacuum and Surface Science. This award is presented annually by The Japan Society of Vacuum and Surface Science to recognize significant contributions to the advancement and development of the surface and vacuum science-related industries. ＜Taiyo Nippon Sanso MOCVD Equipment Division> TNSC has been developing MOCVD (Metal Organic Chemical Vapor Deposition) compound semiconductor production equipment since 1983, and has delivered more than […]
GaN-layered structure
26/11/2020 / Last updated : 13/01/2021 gaspedia semiconductor

AIR WATER Development of new GaN (gallium nitride) layered structure

Establishing technology contributing to the spread of 5th-generation mobilecommunications systems The Air Water Group is promoting a “New Functional Materials Development Project” aimed at creating new value through close collaboration that it has underscored with a “realignment and integration” strategy for pooling technologies, products and ideas from both inside and outside of the Group. Under this project, the Air Water Group position electronics, the environment and renewable energy as strategic markets and understand that success in the electronics market will hinge on developing and supplying electronic materials for 5th-generation mobile communications systems (5G). From the extensive research in this project, Air Water Inc. has successfully developed a new GaN layered […]